He shares the results of his electron-beam lithography experiments in his latest video (embedded below). In e-beam lithography, or EBL, shapes are drawn onto a wafer using an electron beam in a ...

When the high-energy ions strike the sample surface, they interact with the material through various mechanisms, including sputtering, ion implantation, and secondary electron emission. By controlling ...

The latest abilities are offered for electron and ion beam-induced deposition and etching on DualBeam systems with optional Thermo Scientific MultiChem or GIS Gas Delivery Systems. Customized to ...

dry or wet etching, and electrical discharge machining. Lithography equipment used in micromachining can produce MEMS components for use in accelerometers and inkjet printers, pressure sensors, and ...

Tokyo Electron has introduced its Acrevia ... The directional gas cluster beam irradiates the patterned features, etching the feature sidewalls at an optimal wafer tilting angle to adjust critical ...