What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...

Atomic layer etching (ALE) is the reverse of atomic layer deposition (ALD). ALE can be achieved using sequential, self-limiting thermal reactions. We have recently demonstrated Al 2 O 3 ALE [1-3] and ...

As layers become thinner to allow for the next-generation of semiconductor devices, there is a need for ever more precise process control to create and manipulate these layers. The PlasmaPro 100 ALE ...

The Steven M. George research group concentrates on surface chemistry, thin-film growth & etching, and nanoscale engineering. We focus on atomic layer deposition (ALD), atomic layer etching (ALE), and ...

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and Atomic Layer Etching (ALEt). The center also serves as a valuable resource to other fields of research that require state-of-the-art techniques for thin film characterization and resolving surface ...

and Atomic Layer Etching (ALEt). The center serves also as a valuable resource to other fields of research that require state-of-the-art techniques for thin film characterisation and resolving surface ...

The method allows for the controlled removal of as little as 1 percent of a single atomic layer, offering unprecedented ... could become an essential tool for researchers and industry alike.